TY - JOUR
T1 - Low-temperature deposition of y-ba-cu-o superconducting films by thermal chemical vapor deposition
AU - Yamane, Hisanori
AU - Hasei, Masaharu
AU - Kurosawa, Hideyuki
AU - Hirai, Toshio
PY - 1991/6
Y1 - 1991/6
N2 - Y-Ba-Cu-O superconducting films having a zero-resistance temperature of 84-85 K were prepared at 650°C on SrXiO3(100) single-crystal substrates without postannealing by thermal chemical vapor deposition using β-diketone metal chelates as sources and O2 with low partial pressure as a reactant gas. The films mainly consisted of YBa2Cu3OX with a- axis and c-axis orientations normal to the film planes.
AB - Y-Ba-Cu-O superconducting films having a zero-resistance temperature of 84-85 K were prepared at 650°C on SrXiO3(100) single-crystal substrates without postannealing by thermal chemical vapor deposition using β-diketone metal chelates as sources and O2 with low partial pressure as a reactant gas. The films mainly consisted of YBa2Cu3OX with a- axis and c-axis orientations normal to the film planes.
KW - Chemical vapor deposition
KW - Film surface structure
KW - Low-temperature growth
KW - O
KW - Superconducting transition temperature
KW - Y-Ba-Cu-O superconducting film
KW - β-diketone metal chelates
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U2 - 10.1143/JJAP.30.L1003
DO - 10.1143/JJAP.30.L1003
M3 - Article
AN - SCOPUS:0043221379
VL - 30
SP - L1003-L1005
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
IS - 6
ER -