Low temperature deposition of Si-based thin films on plastic films using pulsed-discharge PECVD under near atmospheric pressure

Mitsutaka Matsumoto, Yohei Inayoshi, Maki Suemitsu, Setsuo Nakajima, Tsuyoshi Uehara, Yasutake Toyoshima

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Low temperature (150 °C) deposition of doped and undoped polycrystalline Si (poly-Si) as well as SiNx films on polyethylene terephthalate (PET) films has been achieved with practical deposition rates by using pulsed-plasma CVD under near-atmospheric pressure. The precursor is SiH 4 diluted in H2 for poly-Si while N2 has been additionally used for SiNx. No inert gases such as He was used. A short-pulse based power system has been employed to maintain a stable discharge in the near-atmospheric pressures. With this technique, deposition of poly-Si thin film with virtually no incubation layer is possible, which in the case of P-doped poly-Si shows a Hall mobility (μH) of 1.5 cm 2/Vs.

Original languageEnglish
Title of host publicationAmorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2008
PublisherMaterials Research Society
Pages119-124
Number of pages6
ISBN (Print)9781605110363
DOIs
Publication statusPublished - 2008 Jan 1
Event2008 MRS Spring Meeting - San Francisco, CA, United States
Duration: 2008 Mar 242008 Mar 28

Publication series

NameMaterials Research Society Symposium Proceedings
Volume1066
ISSN (Print)0272-9172

Other

Other2008 MRS Spring Meeting
CountryUnited States
CitySan Francisco, CA
Period08/3/2408/3/28

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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  • Cite this

    Matsumoto, M., Inayoshi, Y., Suemitsu, M., Nakajima, S., Uehara, T., & Toyoshima, Y. (2008). Low temperature deposition of Si-based thin films on plastic films using pulsed-discharge PECVD under near atmospheric pressure. In Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2008 (pp. 119-124). (Materials Research Society Symposium Proceedings; Vol. 1066). Materials Research Society. https://doi.org/10.1557/proc-1066-a05-05