Low-temperature deposition of meta-stable â-MoO3(011) epitaxial thin films using step-and-terrace substrates

Ryota Shimizu, Kuniko Yamamoto, Tohru Suzuki, Takeo Ohsawa, Susumu Shiraki, Taro Hitosugi

    Research output: Contribution to journalArticlepeer-review

    11 Citations (Scopus)

    Abstract

    We demonstrated the epitaxial growth of meta-stable â-MoO3(011) thin films on SrTiO3(100), NdGaO3(110), and NdGaO3(001) substrates, using dc reactive magnetron sputtering. Low-temperature deposition at ∼200 °C resulted in the suppression of the formation of thermodynamically stable α-MoO3, and we observed the growth of a β-MoO3 phasewithmixed orientation. In contrast, depositions on substrate surfaceswith a step-and-terrace structure resulted in uniaxially oriented β-MoO3(011) epitaxial thin films. The step-and-terrace structures were found to play an important role in controlling the epitaxial growth behavior of β-MoO3 thin films.

    Original languageEnglish
    Pages (from-to)153-156
    Number of pages4
    JournalThin Solid Films
    Volume595
    DOIs
    Publication statusPublished - 2015

    Keywords

    • Epitaxial growth
    • Magnetron sputtering
    • Molybdenum oxides
    • Substrate

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films
    • Metals and Alloys
    • Materials Chemistry

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