Abstract
We demonstrated the epitaxial growth of meta-stable â-MoO3(011) thin films on SrTiO3(100), NdGaO3(110), and NdGaO3(001) substrates, using dc reactive magnetron sputtering. Low-temperature deposition at ∼200 °C resulted in the suppression of the formation of thermodynamically stable α-MoO3, and we observed the growth of a β-MoO3 phasewithmixed orientation. In contrast, depositions on substrate surfaceswith a step-and-terrace structure resulted in uniaxially oriented β-MoO3(011) epitaxial thin films. The step-and-terrace structures were found to play an important role in controlling the epitaxial growth behavior of β-MoO3 thin films.
Original language | English |
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Pages (from-to) | 153-156 |
Number of pages | 4 |
Journal | Thin Solid Films |
Volume | 595 |
DOIs | |
Publication status | Published - 2015 |
Keywords
- Epitaxial growth
- Magnetron sputtering
- Molybdenum oxides
- Substrate
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry