Low-temperature deposition of meta-stable â-MoO3(011) epitaxial thin films using step-and-terrace substrates

Ryota Shimizu; Kuniko Yamamoto; Tohru Suzuki; Takeo Ohsawa; Susumu Shiraki; Taro Hitosugi

doi:10.1016/j.tsf.2015.10.066

Low-temperature deposition of meta-stable â-MoO3(011) epitaxial thin films using step-and-terrace substrates

Ryota Shimizu, Kuniko Yamamoto, Tohru Suzuki, Takeo Ohsawa, Susumu Shiraki, Taro Hitosugi

Research output: Contribution to journal › Article › peer-review

11 Citations (Scopus)

Abstract

We demonstrated the epitaxial growth of meta-stable â-MoO3(011) thin films on SrTiO₃(100), NdGaO₃(110), and NdGaO₃(001) substrates, using dc reactive magnetron sputtering. Low-temperature deposition at ∼200 °C resulted in the suppression of the formation of thermodynamically stable α-MoO₃, and we observed the growth of a β-MoO₃ phasewithmixed orientation. In contrast, depositions on substrate surfaceswith a step-and-terrace structure resulted in uniaxially oriented β-MoO₃(011) epitaxial thin films. The step-and-terrace structures were found to play an important role in controlling the epitaxial growth behavior of β-MoO₃ thin films.

Original language	English
Pages (from-to)	153-156
Number of pages	4
Journal	Thin Solid Films
Volume	595
DOIs	https://doi.org/10.1016/j.tsf.2015.10.066
Publication status	Published - 2015

Keywords

Epitaxial growth
Magnetron sputtering
Molybdenum oxides
Substrate

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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title = "Low-temperature deposition of meta-stable {\^a}-MoO3(011) epitaxial thin films using step-and-terrace substrates",

abstract = "We demonstrated the epitaxial growth of meta-stable {\^a}-MoO3(011) thin films on SrTiO3(100), NdGaO3(110), and NdGaO3(001) substrates, using dc reactive magnetron sputtering. Low-temperature deposition at ∼200 °C resulted in the suppression of the formation of thermodynamically stable α-MoO3, and we observed the growth of a β-MoO3 phasewithmixed orientation. In contrast, depositions on substrate surfaceswith a step-and-terrace structure resulted in uniaxially oriented β-MoO3(011) epitaxial thin films. The step-and-terrace structures were found to play an important role in controlling the epitaxial growth behavior of β-MoO3 thin films.",

keywords = "Epitaxial growth, Magnetron sputtering, Molybdenum oxides, Substrate",

author = "Ryota Shimizu and Kuniko Yamamoto and Tohru Suzuki and Takeo Ohsawa and Susumu Shiraki and Taro Hitosugi",

note = "Funding Information: This research was supported by the World Premier International Research Center Initiative (WPI Initiative) of the Ministry of Education, Culture, Sports, Science and Technology of Japan. The authors also acknowledge the support of Plansee . We thank Dr. J. Winkler and Dr. G. Leichtfried for their fruitful discussions. Publisher Copyright: {\textcopyright} 2015 Published by Elsevier B.V. All rights reserved.",

year = "2015",

doi = "10.1016/j.tsf.2015.10.066",

language = "English",

volume = "595",

pages = "153--156",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

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TY - JOUR

T1 - Low-temperature deposition of meta-stable â-MoO3(011) epitaxial thin films using step-and-terrace substrates

AU - Shimizu, Ryota

AU - Yamamoto, Kuniko

AU - Suzuki, Tohru

AU - Ohsawa, Takeo

AU - Shiraki, Susumu

AU - Hitosugi, Taro

N1 - Funding Information: This research was supported by the World Premier International Research Center Initiative (WPI Initiative) of the Ministry of Education, Culture, Sports, Science and Technology of Japan. The authors also acknowledge the support of Plansee . We thank Dr. J. Winkler and Dr. G. Leichtfried for their fruitful discussions. Publisher Copyright: © 2015 Published by Elsevier B.V. All rights reserved.

PY - 2015

Y1 - 2015

N2 - We demonstrated the epitaxial growth of meta-stable â-MoO3(011) thin films on SrTiO3(100), NdGaO3(110), and NdGaO3(001) substrates, using dc reactive magnetron sputtering. Low-temperature deposition at ∼200 °C resulted in the suppression of the formation of thermodynamically stable α-MoO3, and we observed the growth of a β-MoO3 phasewithmixed orientation. In contrast, depositions on substrate surfaceswith a step-and-terrace structure resulted in uniaxially oriented β-MoO3(011) epitaxial thin films. The step-and-terrace structures were found to play an important role in controlling the epitaxial growth behavior of β-MoO3 thin films.

AB - We demonstrated the epitaxial growth of meta-stable â-MoO3(011) thin films on SrTiO3(100), NdGaO3(110), and NdGaO3(001) substrates, using dc reactive magnetron sputtering. Low-temperature deposition at ∼200 °C resulted in the suppression of the formation of thermodynamically stable α-MoO3, and we observed the growth of a β-MoO3 phasewithmixed orientation. In contrast, depositions on substrate surfaceswith a step-and-terrace structure resulted in uniaxially oriented β-MoO3(011) epitaxial thin films. The step-and-terrace structures were found to play an important role in controlling the epitaxial growth behavior of β-MoO3 thin films.

KW - Epitaxial growth

KW - Magnetron sputtering

KW - Molybdenum oxides

KW - Substrate

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M3 - Article

AN - SCOPUS:84954528125

VL - 595

SP - 153

EP - 156

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

ER -

Low-temperature deposition of meta-stable â-MoO3(011) epitaxial thin films using step-and-terrace substrates

Abstract

Keywords

ASJC Scopus subject areas

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