Low-temperature deposition of co/pt film with high-perpendicular magnetic anisotropy by layer stacking sputtering

Naoki Honda, Taruho Tsuchiya, Shin Saito, Hironaga Uchida, Kiyoshi Yamakawa

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

Low-temperature preparation of a Co/Pt layer-stacked film with high-magnetic anisotropy was studied using collimated sputter deposition. Only a trace superlattice line, corresponding to the L11-ordered phase of CoPt, was observed in the X-ray diffraction pattern. However, magnetic properties, exhibited high-saturation magnetization of about 1000 emu/cm3 and large perpendicular magnetic anisotropy, even when the film was deposited at room temperature. For room-temperature deposition, layer-stacked films deposited at a high-Ar pressure of 9.6 Pa exhibited a high coercivity of around 5 kOe and an anisotropy field of around 15 kOe, indicating a high-perpendicular anisotropy of 6.5 × 106 erg/cm3. Deposition at 200 °C increased the anisotropy field up to 20 kOe, indicating a high anisotropy of 1 × 107 erg/cm3. Films deposited without the collimator showed no superlattice line in XRD patterns and exhibited low-saturation magnetization and anisotropy. The cause of the high-perpendicular anisotropy is suggested to be micro ordering in the film.

Original languageEnglish
Article number6971254
JournalIEEE Transactions on Magnetics
Volume50
Issue number11
DOIs
Publication statusPublished - 2014 Nov 1

Keywords

  • Co/Pt film
  • collimated sputtering
  • high-Ar pressure sputtering
  • high-perpendicular magnetic anisotropy
  • layer stacking sputter deposition

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Low-temperature deposition of co/pt film with high-perpendicular magnetic anisotropy by layer stacking sputtering'. Together they form a unique fingerprint.

Cite this