Low-temperature chemical vapor deposition of YBa2Cu3Ox films

Hideaki Zama, Shunri Oda, Takayuki Miyake, Takeo Hattori

    Research output: Contribution to journalArticlepeer-review

    2 Citations (Scopus)

    Abstract

    Low-temperature growth of YBa2Cu3Ox films by CVD has been investigated using Y (DPM)3, Ba (DPM)2 and Cu (DPM)2 as starting materials and N2O as an oxidizing agent. 123-perovskite structure has been prepared at a substrate temperature of 530°C. Superconducting films with zero-resistivity Tc of 15K and Tonset=87K has been obtained at Tsub=610°C and Tc=83K, Tonset=89K at Tsub=650°C. A 254nm-light has promoted decomposition of β-diketonate complex at Tsub=215°C.

    Original languageEnglish
    Pages (from-to)2103-2104
    Number of pages2
    JournalPhysica C: Superconductivity and its applications
    Volume185-189
    Issue numberPART 3
    DOIs
    Publication statusPublished - 1991 Dec 1

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Condensed Matter Physics
    • Energy Engineering and Power Technology
    • Electrical and Electronic Engineering

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