Low temperature chemical vapor deposition of silicon-rich tungsten silicide films from tungsten hexafluoride - Disilane pre-activated mixtures

Takeyasu Saito, Keiji Oshima, Yukihiro Shimogaki, Yasuyuki Egashira, Katsuro Sugawara, Katsumi Takahiro, Shinji Nagata, Sadae Yamaguchi, Hiroshi Komiyama

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Fingerprint Dive into the research topics of 'Low temperature chemical vapor deposition of silicon-rich tungsten silicide films from tungsten hexafluoride - Disilane pre-activated mixtures'. Together they form a unique fingerprint.

Chemical Compounds

Engineering & Materials Science