Abstract
We have decreased remarkably the insertion loss of a laminated polarization splitter (LPS) designed for wavelengths longer than 1.3 μm, which consists of a-SiC:H/SiO2 multilayers prepared by plasma enhanced chemical vapor deposition. Previously fabricated LPSs have the problem of a large scattering loss because the surface of the multilayer film is not sufficiently flat; this is especially remarkable in the SiO2 film. The flatness of the SiO2 film is improved by optimization of the substrate temperature and flow rate of the source gases. The a-SiC:H film with a high refractive index and low absorption is obtained by optimizing the mixing of source gases at fixed substrate temperature. The total loss of a multilayer film at normal incidence is decreased from 1.22 × 10-2 dB μm-1 (previous work) to 1.4 × 10-3 dB μm-1. The insertion loss of the LPS is also decreased from 5.2 × 10-2 dB μm-1 (previous work) to 7 × 10-3 dB μm-1.
Original language | English |
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Pages (from-to) | 179-183 |
Number of pages | 5 |
Journal | Thin Solid Films |
Volume | 292 |
Issue number | 1-2 |
DOIs | |
Publication status | Published - 1997 Jan 5 |
Keywords
- Chemical vapour disposition
- Multilayers
- Optical properties
- Silicon carbide
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry