Low loss laminated polarization splitters for wavelengths longer than 1.3 μm prepared by plasma enhanced chemical vapor deposition

Yong Gi Lee, Takayuki Kawashima, Osamu Hanaizumi, Isao Takahashi, Jun Ichi Murota, Shojiro Kawakami

Research output: Contribution to journalArticle

Abstract

We have decreased remarkably the insertion loss of a laminated polarization splitter (LPS) designed for wavelengths longer than 1.3 μm, which consists of a-SiC:H/SiO2 multilayers prepared by plasma enhanced chemical vapor deposition. Previously fabricated LPSs have the problem of a large scattering loss because the surface of the multilayer film is not sufficiently flat; this is especially remarkable in the SiO2 film. The flatness of the SiO2 film is improved by optimization of the substrate temperature and flow rate of the source gases. The a-SiC:H film with a high refractive index and low absorption is obtained by optimizing the mixing of source gases at fixed substrate temperature. The total loss of a multilayer film at normal incidence is decreased from 1.22 × 10-2 dB μm-1 (previous work) to 1.4 × 10-3 dB μm-1. The insertion loss of the LPS is also decreased from 5.2 × 10-2 dB μm-1 (previous work) to 7 × 10-3 dB μm-1.

Original languageEnglish
Pages (from-to)179-183
Number of pages5
JournalThin Solid Films
Volume292
Issue number1-2
DOIs
Publication statusPublished - 1997 Jan 5

Keywords

  • Chemical vapour disposition
  • Multilayers
  • Optical properties
  • Silicon carbide

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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