Low leakage current Al2O3 metal-insulator-metal capacitors formed by atomic layer deposition at optimized process temperature and O2 post deposition annealing

Y. Koda, H. Sugita, Tomoyuki Suwa, Rihito Kuroda, Takashi Goto, Akinobu Teramoto, Shigetoshi Sugawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

12 Citations (Scopus)

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Engineering & Materials Science