Low-damage low- k etching with an environmentally friendly C F3 i plasma

Eiichi Soda, Seiichi Kondo, Shuichi Saito, Yoshinari Ichihashi, Aiko Sato, Hiroto Ohtake, Seiji Samukawa

Research output: Contribution to journalArticlepeer-review

22 Citations (Scopus)

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Chemical Compounds

Engineering & Materials Science

Physics & Astronomy