Low-damage atomic layer modification of self-assembled monolayer using neutral beam process

Yasushi Ishikawa, Seiji Samukawa, Takao Ishida

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

Damage-free surface nitridation of terphenyl methanethiol self-assembled monolayers (TP1-SAMs) was investigated using a novel low-energy N2 neutral beam (NB) irradiation technique. When a conventional inductively coupled plasma process was used, x-ray photoelectron spectra confirmed that the TP1-SAM was quickly broken because ions or ultraviolet (UV) photons enhance the surface decomposition and molecular desorption. Conversely, with the N 2 NB radiation process, which is free of ions and UV photons, there was little difference in the atomic ratios of x-ray photoelectron spectra before and after NB irradiation. These results suggest that low-damage surface modification is possible through the authors' NB technique.

Original languageEnglish
Article number123122
JournalApplied Physics Letters
Volume89
Issue number12
DOIs
Publication statusPublished - 2006 Sep 29

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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