Abstract
Stitching errors in the phase mask degrade the spectral response of fiber Bragg gratings fabricated with the phase mask technique. We successfully fabricated a stitching error-free phase mask and applied it to the fabrication of fiber Bragg gratings (FBG's). The gratings have no observable excess sidelobes in the reflectivity and show excellent wavelength selectivity.
| Original language | English |
|---|---|
| Pages (from-to) | 687-689 |
| Number of pages | 3 |
| Journal | IEEE Photonics Technology Letters |
| Volume | 10 |
| Issue number | 3 |
| Publication status | Published - 1998 Mar 1 |
| Externally published | Yes |
Keywords
- Electron-beam lithography
- Filtering
- Masks
- Optical device fabrication
- Optical fiber device
- Wavelength-division multiplexing
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Electrical and Electronic Engineering