Abstract
Stitching errors in the phase mask degrade the spectral response of fiber Bragg gratings fabricated with the phase mask technique. We successfully fabricated a stitching error-free phase mask and applied it to the fabrication of fiber Bragg gratings (FBG's). The gratings have no observable excess sidelobes in the reflectivity and show excellent wavelength selectivity.
Original language | English |
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Pages (from-to) | 687-689 |
Number of pages | 3 |
Journal | IEEE Photonics Technology Letters |
Volume | 10 |
Issue number | 3 |
Publication status | Published - 1998 Mar 1 |
Externally published | Yes |
Keywords
- Electron-beam lithography
- Filtering
- Masks
- Optical device fabrication
- Optical fiber device
- Wavelength-division multiplexing
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Electrical and Electronic Engineering