Localized high-rate deposition of zinc oxide films at atmospheric pressure using inductively coupled microplasma

Sven Stauss, Yasuo Imanishi, Hiroyuki Miyazoe, Kazuo Terashima

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)

Abstract

Linear transparent zinc oxide films were fabricated using an inductively coupled microplasma jet generated in argon under atmospheric conditions. The films were formed by the sputtering and melting of a zinc filament placed inside the plasma. Film growth rates varied between 10 to 30 nm/s for input powers between 20 and 30 W. Film roughness below 20 nm and optical transmittances up to 90% in the visible were obtained while the sheet resistances ranged between 2 × 104 and 1 × 105Ω/□. The presented technique may allow high-rate, localized, fabrication of functional ZnO films for optoelectronic applications.

Original languageEnglish
Pages (from-to)5391-5395
Number of pages5
JournalThin Solid Films
Volume518
Issue number19
DOIs
Publication statusPublished - 2010 Jul 30
Externally publishedYes

Keywords

  • Plasma processing and deposition
  • Sputtering
  • Zinc oxide

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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