Light scattering by submicron particles on film-coated wafers

Hideyuki Kondo, Shigenari Yanagi, Kazushige Takaishi, Takayuki Shingyouji, Tatsuo Yoshinobu, Hiroshi Iwasaki

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The intensity of light scattered by particles on film-coated wafers was measured as a function of film thickness using two types of particle counter with different optical configurations. The scattered light intensity was found to oscillate periodically with film thickness; the period of oscillation was in agreement with that of the reflectivity of the incident beam, and significant enhancement of scattering intensity was observed for thicknesses less than about 0.3 μm.

Original languageEnglish
Pages (from-to)L616-L618
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume35
Issue number5 B
Publication statusPublished - 1996 Jan 1
Externally publishedYes

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

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  • Cite this

    Kondo, H., Yanagi, S., Takaishi, K., Shingyouji, T., Yoshinobu, T., & Iwasaki, H. (1996). Light scattering by submicron particles on film-coated wafers. Japanese Journal of Applied Physics, Part 2: Letters, 35(5 B), L616-L618.