Layer-by-layer growth of precisely controlled hetero-molecular multi-layers and superlattice structures

Nobuya Hiroshiba, Jonathan P. Hill, Ryoma Hayakawa, Katsuhiko Ariga, Kiyoto Matsuishi, Yutaka Wakayama

    Research output: Contribution to journalArticlepeer-review

    3 Citations (Scopus)

    Abstract

    We demonstrate a technique for growing fine molecular films on a monolayer scale. We achieve layer-by-layer growth under thermally equilibrium condition by precisely controlling the conditions of an ultra-slow deposition technique. This technique is applicable to various kinds of p-type and n-type organic semiconductors and makes it possible to form a hetero-molecular interface (p-n junction) with molecular level flatness. The technique was used to produce a molecular superlattice, which enables the well-controlled design of energy level alignments in organic semiconductors.

    Original languageEnglish
    Pages (from-to)74-77
    Number of pages4
    JournalThin Solid Films
    Volume554
    DOIs
    Publication statusPublished - 2014 Mar 3

    Keywords

    • AFM
    • Hetero interface
    • Hot-wall deposition
    • Molecular layers
    • Super lattice
    • X-ray reflection

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films
    • Metals and Alloys
    • Materials Chemistry

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