La2O3 gate dielectric thin film with Sc 2O3 buffer layer for high temperature annealing

Yasuhiro Shiino, Kuniyuki Kakushima, Parhat Ahmet, Kazuo Tsutsui, Nobuyuki Sugii, Takeo Hattori, Hiroshi Iwai

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Leakage current characteristics of high temperature annealed La 2O3 film with Sc2O3 buffer layer was reported. Large amount of leakage current suppression was obtained by inserting Sc2O3 when annealed at high temperature, without degrading the Equivalent Oxide Thickness (EOT). La2O 3/Sc2O3 gate stack would be one of the solution for La2O3-based gate insulator for high temperature annealing. copyright The Electrochemical Society.

Original languageEnglish
Title of host publicationPhysics and Technology of High-k Gate Dielectrics 4
PublisherElectrochemical Society Inc.
Pages511-519
Number of pages9
Edition3
ISBN (Electronic)1566775035
DOIs
Publication statusPublished - 2006
Externally publishedYes
EventPhysics and Technology of High-k Gate Dielectrics 4 - 210th Electrochemical Society Meeting - Cancun, Mexico
Duration: 2006 Oct 292006 Nov 3

Publication series

NameECS Transactions
Number3
Volume3
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Other

OtherPhysics and Technology of High-k Gate Dielectrics 4 - 210th Electrochemical Society Meeting
Country/TerritoryMexico
CityCancun
Period06/10/2906/11/3

ASJC Scopus subject areas

  • Engineering(all)

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