Laser projection CVD using the low temperature condensation method

Kohji Takashima, Kazuyuki Minami, Masayoshi Esashi, Jun ichi Nishizawa

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

Laser projection CVD using the low temperature condensation method was developed. By irradiating a cooled substrate with an ArF excimer laser in an organic gas environment, polymethylmethacrylate (PMMA), tin dioxide and silicon dioxide films were deposited selectively with a high deposition rate of about 0.1 μm min-1. Special attention was given to the silicon dioxide film in order to obtain a high deposition rate and good quality. These films can be deposited successively, being promising for the realization of stacked microstructures. This technique can be also applied where a uniform resist coating is not possible. By using this technique, the PMMA film was selectively deposited on the end of an optical fiber.

Original languageEnglish
Pages (from-to)366-374
Number of pages9
JournalApplied Surface Science
Volume79-80
Issue numberC
DOIs
Publication statusPublished - 1994 May 2

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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