Laser interference lithography with a modified two-axis Lloyd's mirror interferometer for fabrication of two-dimensional micro patterns

Yindi Cai, Xinghui Li, Ryo Aihara, Yuki Shimizu, So Ito, I Ko

Research output: Contribution to conferencePaper

1 Citation (Scopus)

Abstract

This paper presents a design study on an optical setup for fabrication of a two-dimensional grating used in encoder systems. By adding major modifications to the conventional one-axis Lloyd's mirror interferometer, a modified two-axis Lloyd's mirror interferometer has been developed. Based on the wave optics, the two-axis interference patterns to be generated by the proposed optical configuration are simulated. To eliminate unwanted distortion of the two-dimensional micro patterns, polarization of the laser beams is controlled by inserting two half wave plates in the optical path. In addition, pattern exposure tests are carried out by using a prototype optical setup.

Original languageEnglish
Publication statusPublished - 2015 Oct 18
Event8th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2015 - Kyoto, Japan
Duration: 2015 Oct 182015 Oct 22

Other

Other8th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2015
CountryJapan
CityKyoto
Period15/10/1815/10/22

Keywords

  • Grating
  • Interference lithography
  • Lloyd's mirror interferometer
  • Wave optics

ASJC Scopus subject areas

  • Industrial and Manufacturing Engineering

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  • Cite this

    Cai, Y., Li, X., Aihara, R., Shimizu, Y., Ito, S., & Ko, I. (2015). Laser interference lithography with a modified two-axis Lloyd's mirror interferometer for fabrication of two-dimensional micro patterns. Paper presented at 8th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2015, Kyoto, Japan.