Laser chemical vapor deposition of titanium nitride films with tetrakis (diethylamido) titanium and ammonia system

Yansheng Gong; Rong Tu; Takashi Goto

doi:10.1016/j.surfcoat.2009.10.042

Laser chemical vapor deposition of titanium nitride films with tetrakis (diethylamido) titanium and ammonia system

Yansheng Gong, Rong Tu, Takashi Goto

Materials Processing and Characterization Division

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

Wide-area and thick titanium nitride (TiN_x) films were prepared on Al₂O₃ substrate by laser chemical vapor deposition (LCVD) using tetrakis (diethylamido) titanium (TDEAT) and ammonia (NH₃) as source materials. Effects of laser power (P_L) and pre-heating temperature (T_pre) on the composition, microstructure and deposition rate of TiN_x films were investigated. (111) and (200) oriented TiN_x films in a single phase were obtained. The lattice parameter and N to Ti ratio of the TiN_x films slightly increased with increasing P_L and was close to stoichiometric at P_L > 150 W. TiN_x films had a cauliflower-like surface and columnar cross section. The deposition rate of TiN_x films increased from 42 to 90 μm/h at a depositing area of 10 mm by 10 mm substrate, decreasing with increasing P_L and T_pre. The highest volume deposition rate of TiN_x films was about 10² to 10⁵ times greater than those of previous LCVD using Nd:YAG laser, argon ion laser and excimer laser.

Original language	English
Pages (from-to)	2111-2117
Number of pages	7
Journal	Surface and Coatings Technology
Volume	204
Issue number	14
DOIs	https://doi.org/10.1016/j.surfcoat.2009.10.042
Publication status	Published - 2010 Apr 15

Keywords

High speed deposition
LCVD
Microstructure
TDEAT
TiN films

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

Access to Document

10.1016/j.surfcoat.2009.10.042

Cite this

@article{7748f9631562476382a25cf60c7a51c1,

title = "Laser chemical vapor deposition of titanium nitride films with tetrakis (diethylamido) titanium and ammonia system",

abstract = "Wide-area and thick titanium nitride (TiNx) films were prepared on Al2O3 substrate by laser chemical vapor deposition (LCVD) using tetrakis (diethylamido) titanium (TDEAT) and ammonia (NH3) as source materials. Effects of laser power (PL) and pre-heating temperature (Tpre) on the composition, microstructure and deposition rate of TiNx films were investigated. (111) and (200) oriented TiNx films in a single phase were obtained. The lattice parameter and N to Ti ratio of the TiNx films slightly increased with increasing PL and was close to stoichiometric at PL > 150 W. TiNx films had a cauliflower-like surface and columnar cross section. The deposition rate of TiNx films increased from 42 to 90 μm/h at a depositing area of 10 mm by 10 mm substrate, decreasing with increasing PL and Tpre. The highest volume deposition rate of TiNx films was about 102 to 105 times greater than those of previous LCVD using Nd:YAG laser, argon ion laser and excimer laser.",

keywords = "High speed deposition, LCVD, Microstructure, TDEAT, TiN films",

author = "Yansheng Gong and Rong Tu and Takashi Goto",

year = "2010",

month = apr,

day = "15",

doi = "10.1016/j.surfcoat.2009.10.042",

language = "English",

volume = "204",

pages = "2111--2117",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier",

number = "14",

}

TY - JOUR

T1 - Laser chemical vapor deposition of titanium nitride films with tetrakis (diethylamido) titanium and ammonia system

AU - Gong, Yansheng

AU - Tu, Rong

AU - Goto, Takashi

PY - 2010/4/15

Y1 - 2010/4/15

N2 - Wide-area and thick titanium nitride (TiNx) films were prepared on Al2O3 substrate by laser chemical vapor deposition (LCVD) using tetrakis (diethylamido) titanium (TDEAT) and ammonia (NH3) as source materials. Effects of laser power (PL) and pre-heating temperature (Tpre) on the composition, microstructure and deposition rate of TiNx films were investigated. (111) and (200) oriented TiNx films in a single phase were obtained. The lattice parameter and N to Ti ratio of the TiNx films slightly increased with increasing PL and was close to stoichiometric at PL > 150 W. TiNx films had a cauliflower-like surface and columnar cross section. The deposition rate of TiNx films increased from 42 to 90 μm/h at a depositing area of 10 mm by 10 mm substrate, decreasing with increasing PL and Tpre. The highest volume deposition rate of TiNx films was about 102 to 105 times greater than those of previous LCVD using Nd:YAG laser, argon ion laser and excimer laser.

AB - Wide-area and thick titanium nitride (TiNx) films were prepared on Al2O3 substrate by laser chemical vapor deposition (LCVD) using tetrakis (diethylamido) titanium (TDEAT) and ammonia (NH3) as source materials. Effects of laser power (PL) and pre-heating temperature (Tpre) on the composition, microstructure and deposition rate of TiNx films were investigated. (111) and (200) oriented TiNx films in a single phase were obtained. The lattice parameter and N to Ti ratio of the TiNx films slightly increased with increasing PL and was close to stoichiometric at PL > 150 W. TiNx films had a cauliflower-like surface and columnar cross section. The deposition rate of TiNx films increased from 42 to 90 μm/h at a depositing area of 10 mm by 10 mm substrate, decreasing with increasing PL and Tpre. The highest volume deposition rate of TiNx films was about 102 to 105 times greater than those of previous LCVD using Nd:YAG laser, argon ion laser and excimer laser.

KW - High speed deposition

KW - LCVD

KW - Microstructure

KW - TDEAT

KW - TiN films

UR - http://www.scopus.com/inward/record.url?scp=76349090672&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=76349090672&partnerID=8YFLogxK

U2 - 10.1016/j.surfcoat.2009.10.042

DO - 10.1016/j.surfcoat.2009.10.042

M3 - Article

AN - SCOPUS:76349090672

SN - 0257-8972

VL - 204

SP - 2111

EP - 2117

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - 14

ER -

Laser chemical vapor deposition of titanium nitride films with tetrakis (diethylamido) titanium and ammonia system

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this