Laser chemical vapor deposition of TiN film on Ti(C,N)-based cermet substrate using Ti(OiPr)2(dpm)2-NH3 system

Yu You, Akihiko Ito, Rong Tu, Takashi Goto

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

TiN films were prepared on Ti(C,N)-based cermet substrate by laser chemical vapor deposition using titanium isopropoxide dipivaloylmethane [Ti(OiPr) 2(dpm)2] and ammonia (NH3) as precursors. The effects of deposition temperature (Tdep) and laser power (P L) on the crystal phase, microstructure and adhesion were investigated. TiN film was prepared at Tdep > 903K (PL > 100 W). The microstructure of TiN film changed from rose-like grains to pyramid-like grains to aggregate grains with increasing PL and T dep. Highly adhesive film was obtained at moderate Tdep = 1047K (PL = 120 W).

Original languageEnglish
Pages (from-to)310-313
Number of pages4
JournalJournal of the Ceramic Society of Japan
Volume119
Issue number1388
DOIs
Publication statusPublished - 2011 Apr

Keywords

  • Adhesion
  • Laser chemical vapor deposition
  • Microstructure
  • TiN film

ASJC Scopus subject areas

  • Ceramics and Composites
  • Chemistry(all)
  • Condensed Matter Physics
  • Materials Chemistry

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