Laser annealed junctions: Process integration sequence optimization for advanced CMOS technologies

T. Hoffmann, T. Noda, S. Felch, S. Severi, V. Parihar, H. Forstner, C. Vrancken, M. De Potter, B. Van Daele, H. Bender, M. Niwa, R. Schreutelkamp, W. Vandervorst, S. Biesemans, P. P. Absil

Research output: Chapter in Book/Report/Conference proceedingConference contribution

24 Citations (Scopus)

Abstract

We report a record 9% improvement in pMOS performance achieved by using non-melt laser annealing followed by spike-RTA in a conventional poly-Si/SiON CMOS flow. This is the highest pMOS gain with milli-second anneal reported to date, while maintaining at the same time a 7% nMOS gain. The gain is correlated not only to poly-depletion reduction but also to significant S/D resistance lowering. The latter is obtained by switching the annealing sequence, performing laser prior to the Spike-RTA anneal. Different integration sequences and the influence of the absorbing layer on dopants activation and diffusion are investigated in detail in this study. It enables significant transistor performance and short-channel effect improvement over a Spike-RTA reference.

Original languageEnglish
Title of host publicationExtended Abstracts of the 7th International Workshop on Junction Technology, IWJT 2007
PublisherIEEE Computer Society
Pages137-140
Number of pages4
ISBN (Print)1424411033, 9781424411030
DOIs
Publication statusPublished - 2007 Jan 1
Externally publishedYes
Event7th International Workshop on Junction Technologies, IWJT 2007 - Kyoto, Japan
Duration: 2007 Jun 82007 Jun 9

Publication series

NameExtended Abstracts of the 7th International Workshop on Junction Technology, IWJT 2007

Other

Other7th International Workshop on Junction Technologies, IWJT 2007
CountryJapan
CityKyoto
Period07/6/807/6/9

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Laser annealed junctions: Process integration sequence optimization for advanced CMOS technologies'. Together they form a unique fingerprint.

Cite this