Large-Diameter Reactive Plasma Produced by a Plane Electron Cyclotron Resonance Antenna

Takeshige Ishida, Yukito Nakagawa, Takashi Ono, Satoru Iizuka, Noriyoshi Sato

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

A large-diameter and uniform SF6 (sulfur hexafluoride) plasma is produced by a plane slotted antenna with permanent magnets for electron cyclotron resonance. The plasma is fairly homogeneous similarly to the case of an argon plasma, and the uniformity is within ±3% for a diameter of ∼20 cm at a distance of 20 cm from the antenna. Similar uniformity is obtained in the etching process of polysilicon. The etching rate is enhanced by the assistance of ion acceleration using the RF self-bias technique.

Original languageEnglish
Number of pages1
JournalJapanese journal of applied physics
Volume33
Issue number7S
DOIs
Publication statusPublished - 1994 Jul

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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