Large area VHF plasma sources

T. Takagi; M. Ueda; N. Ito; Y. Watabe; H. Sato; K. Sawaya

doi:10.1016/j.tsf.2005.07.235

Large area VHF plasma sources

T. Takagi, M. Ueda, N. Ito, Y. Watabe, H. Sato, K. Sawaya

Research output: Contribution to journal › Conference article › peer-review

13 Citations (Scopus)

Abstract

Array antenna, a novel plasma source, was developed to realize uniform deposition of silicon thin films such as amorphous silicon and microcrystalline silicon on large area substrates with power frequency in the VHF band. It consists of plural U-shaped loop antenna type electrodes, and silicon thin films are uniformly deposited on over > 1 m² substrates by introducing VHF power at 85 MHz with anti-phase. The VHF PCVD system with array antenna is suitable for the mass-production of silicon thin film solar cells due to its high throughput achieved by double-sided, multi-zone deposition.

Original language	English
Pages (from-to)	50-54
Number of pages	5
Journal	Thin Solid Films
Volume	502
Issue number	1-2
DOIs	https://doi.org/10.1016/j.tsf.2005.07.235
Publication status	Published - 2006 Apr 28
Event	Selected Papers from the 5th International Conference on Caotings on Glass (ICCG5) - Duration: 2004 Jul 4 → 2004 Jul 8

Keywords

CVD
Glow discharge
Plasma processing and deposition
Silicon

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/j.tsf.2005.07.235

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title = "Large area VHF plasma sources",

abstract = "Array antenna, a novel plasma source, was developed to realize uniform deposition of silicon thin films such as amorphous silicon and microcrystalline silicon on large area substrates with power frequency in the VHF band. It consists of plural U-shaped loop antenna type electrodes, and silicon thin films are uniformly deposited on over > 1 m2 substrates by introducing VHF power at 85 MHz with anti-phase. The VHF PCVD system with array antenna is suitable for the mass-production of silicon thin film solar cells due to its high throughput achieved by double-sided, multi-zone deposition.",

keywords = "CVD, Glow discharge, Plasma processing and deposition, Silicon",

author = "T. Takagi and M. Ueda and N. Ito and Y. Watabe and H. Sato and K. Sawaya",

note = "Funding Information: This work was partially supported by the New Energy and Industrial Technology Development Organization (NEDO, Japan).; Selected Papers from the 5th International Conference on Caotings on Glass (ICCG5) ; Conference date: 04-07-2004 Through 08-07-2004",

year = "2006",

month = apr,

day = "28",

doi = "10.1016/j.tsf.2005.07.235",

language = "English",

volume = "502",

pages = "50--54",

journal = "Thin Solid Films",

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TY - JOUR

T1 - Large area VHF plasma sources

AU - Takagi, T.

AU - Ueda, M.

AU - Ito, N.

AU - Watabe, Y.

AU - Sato, H.

AU - Sawaya, K.

N1 - Funding Information: This work was partially supported by the New Energy and Industrial Technology Development Organization (NEDO, Japan).

PY - 2006/4/28

Y1 - 2006/4/28

N2 - Array antenna, a novel plasma source, was developed to realize uniform deposition of silicon thin films such as amorphous silicon and microcrystalline silicon on large area substrates with power frequency in the VHF band. It consists of plural U-shaped loop antenna type electrodes, and silicon thin films are uniformly deposited on over > 1 m2 substrates by introducing VHF power at 85 MHz with anti-phase. The VHF PCVD system with array antenna is suitable for the mass-production of silicon thin film solar cells due to its high throughput achieved by double-sided, multi-zone deposition.

AB - Array antenna, a novel plasma source, was developed to realize uniform deposition of silicon thin films such as amorphous silicon and microcrystalline silicon on large area substrates with power frequency in the VHF band. It consists of plural U-shaped loop antenna type electrodes, and silicon thin films are uniformly deposited on over > 1 m2 substrates by introducing VHF power at 85 MHz with anti-phase. The VHF PCVD system with array antenna is suitable for the mass-production of silicon thin film solar cells due to its high throughput achieved by double-sided, multi-zone deposition.

KW - CVD

KW - Glow discharge

KW - Plasma processing and deposition

KW - Silicon

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DO - 10.1016/j.tsf.2005.07.235

M3 - Conference article

AN - SCOPUS:33344454989

VL - 502

SP - 50

EP - 54

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

IS - 1-2

T2 - Selected Papers from the 5th International Conference on Caotings on Glass (ICCG5)

Y2 - 4 July 2004 through 8 July 2004

ER -

Large area VHF plasma sources

Abstract

Keywords

ASJC Scopus subject areas

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