Large area VHF plasma sources

T. Takagi, M. Ueda, N. Ito, Y. Watabe, H. Sato, K. Sawaya

Research output: Contribution to journalConference articlepeer-review

13 Citations (Scopus)

Abstract

Array antenna, a novel plasma source, was developed to realize uniform deposition of silicon thin films such as amorphous silicon and microcrystalline silicon on large area substrates with power frequency in the VHF band. It consists of plural U-shaped loop antenna type electrodes, and silicon thin films are uniformly deposited on over > 1 m2 substrates by introducing VHF power at 85 MHz with anti-phase. The VHF PCVD system with array antenna is suitable for the mass-production of silicon thin film solar cells due to its high throughput achieved by double-sided, multi-zone deposition.

Original languageEnglish
Pages (from-to)50-54
Number of pages5
JournalThin Solid Films
Volume502
Issue number1-2
DOIs
Publication statusPublished - 2006 Apr 28
EventSelected Papers from the 5th International Conference on Caotings on Glass (ICCG5) -
Duration: 2004 Jul 42004 Jul 8

Keywords

  • CVD
  • Glow discharge
  • Plasma processing and deposition
  • Silicon

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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