KINETICS OF THE GENERATION OF ATOMIC HYDROGEN AND ITS ADSORPTION ON Si(110).

Toshio Sakurai, M. J. Cardillo, H. D. Hagstrum

    Research output: Chapter in Book/Report/Conference proceedingChapter

    28 Citations (Scopus)

    Abstract

    The rate of change of uv photoemission spectroscopy (UPS) spectral features accompanying formation of the monohydride phase on Si(110)5 multiplied by 1 is measured as a function of H//2 pressure and W filament temperature in a thermal activation source. It is shown that an equilibrium thermodynamic calculation can reproduce the observed rates only if the adsorbing species produced at the hot filaments is atomic H and not vibrationally excited H//2. An approximate calculation of absolute rates makes sense only if the sticking probability of atomic hydrogen on clean, room-temperature Si (110) 5 multiplied by 1 is near unity.

    Original languageEnglish
    Title of host publicationJ Vac Sci Technol
    Pages397-399
    Number of pages3
    Volume14
    Edition1
    Publication statusPublished - 1976 Jan
    EventProc of Natl Symp of AVS, 23rd - Chicago, IL, USA
    Duration: 1976 Sep 211976 Sep 24

    Other

    OtherProc of Natl Symp of AVS, 23rd
    CityChicago, IL, USA
    Period76/9/2176/9/24

    ASJC Scopus subject areas

    • Engineering(all)

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