Kinetic modeling of tungsten silicide chemical vapor deposition from WF6 and Si2H6: Determination of the reaction scheme and the gas-phase reaction rates

Takeyasu Saito, Keiji Oshima, Yukihiro Shimogaki, Yasuyuki Egashira, Katsuro Sugawara, Katsumi Takahiro, Shinji Nagata, Sadae Yamaguchi, Hiroshi Komiyama

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Kinetic modeling of tungsten silicide chemical vapor deposition from WF<sub>6</sub> and Si<sub>2</sub>H<sub>6</sub>: Determination of the reaction scheme and the gas-phase reaction rates'. Together they form a unique fingerprint.

Engineering & Materials Science

Chemical Compounds