Irradiation damage in Fe-Co thin films with low-energy ion beam

Yuichi Ohsawa; Kiyoshi Yamakawa; Hiroaki Muraoka

doi:10.1109/TMAG.2010.2045109

Irradiation damage in Fe-Co thin films with low-energy ion beam

Yuichi Ohsawa, Kiyoshi Yamakawa, Hiroaki Muraoka

Broadband Engineering Division

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

The authors estimated the effect of ion-beam irradiation damage on saturation magnetic flux density (B_s) in Fe-Co thin films, a material expected to be used as a main pole in write heads in the era of Tbits/in ² recording density. Fe-Co thin film deposition and successive ion-beam irradiation at 250 eV and a capping layer deposition were performed in the same ion-beam etching apparatus without breaking vacuum. The etching tests revealed B_s of the films with thickness of about 10 nm was decreased by the ion-beam irradiation; about 0.10.2 T decrease in B_s was observed with several nanometers etching. Regardless of etching depth, about 0.1 T decrease in B_s would appear even in the case of shallow etching of about 1 nm. Damage control in the main pole fabrication would be one of the important issues for the write heads.

Original language	English
Article number	5467395
Pages (from-to)	2044-2047
Number of pages	4
Journal	IEEE Transactions on Magnetics
Volume	46
Issue number	6
DOIs	https://doi.org/10.1109/TMAG.2010.2045109
Publication status	Published - 2010 Jun

Keywords

Ion beam applications
Iron alloys
Magnetic heads
Magnetic materials
Magnetic recording

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering

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10.1109/TMAG.2010.2045109

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title = "Irradiation damage in Fe-Co thin films with low-energy ion beam",

abstract = "The authors estimated the effect of ion-beam irradiation damage on saturation magnetic flux density (Bs) in Fe-Co thin films, a material expected to be used as a main pole in write heads in the era of Tbits/in 2 recording density. Fe-Co thin film deposition and successive ion-beam irradiation at 250 eV and a capping layer deposition were performed in the same ion-beam etching apparatus without breaking vacuum. The etching tests revealed Bs of the films with thickness of about 10 nm was decreased by the ion-beam irradiation; about 0.10.2 T decrease in Bs was observed with several nanometers etching. Regardless of etching depth, about 0.1 T decrease in Bs would appear even in the case of shallow etching of about 1 nm. Damage control in the main pole fabrication would be one of the important issues for the write heads.",

keywords = "Ion beam applications, Iron alloys, Magnetic heads, Magnetic materials, Magnetic recording",

author = "Yuichi Ohsawa and Kiyoshi Yamakawa and Hiroaki Muraoka",

note = "Funding Information: This work was supported in part by the Research and Development for Next-Generation Information Technology program of the Ministry of Education, Culture, Sports, Science and Technology (MEXT) of Japan. The authors would like to thank Prof. Shimatsu, Tohoku University, for valuable comments.",

year = "2010",

month = jun,

doi = "10.1109/TMAG.2010.2045109",

language = "English",

volume = "46",

pages = "2044--2047",

journal = "IEEE Transactions on Magnetics",

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publisher = "Institute of Electrical and Electronics Engineers Inc.",

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T1 - Irradiation damage in Fe-Co thin films with low-energy ion beam

AU - Ohsawa, Yuichi

AU - Yamakawa, Kiyoshi

AU - Muraoka, Hiroaki

N1 - Funding Information: This work was supported in part by the Research and Development for Next-Generation Information Technology program of the Ministry of Education, Culture, Sports, Science and Technology (MEXT) of Japan. The authors would like to thank Prof. Shimatsu, Tohoku University, for valuable comments.

PY - 2010/6

Y1 - 2010/6

N2 - The authors estimated the effect of ion-beam irradiation damage on saturation magnetic flux density (Bs) in Fe-Co thin films, a material expected to be used as a main pole in write heads in the era of Tbits/in 2 recording density. Fe-Co thin film deposition and successive ion-beam irradiation at 250 eV and a capping layer deposition were performed in the same ion-beam etching apparatus without breaking vacuum. The etching tests revealed Bs of the films with thickness of about 10 nm was decreased by the ion-beam irradiation; about 0.10.2 T decrease in Bs was observed with several nanometers etching. Regardless of etching depth, about 0.1 T decrease in Bs would appear even in the case of shallow etching of about 1 nm. Damage control in the main pole fabrication would be one of the important issues for the write heads.

AB - The authors estimated the effect of ion-beam irradiation damage on saturation magnetic flux density (Bs) in Fe-Co thin films, a material expected to be used as a main pole in write heads in the era of Tbits/in 2 recording density. Fe-Co thin film deposition and successive ion-beam irradiation at 250 eV and a capping layer deposition were performed in the same ion-beam etching apparatus without breaking vacuum. The etching tests revealed Bs of the films with thickness of about 10 nm was decreased by the ion-beam irradiation; about 0.10.2 T decrease in Bs was observed with several nanometers etching. Regardless of etching depth, about 0.1 T decrease in Bs would appear even in the case of shallow etching of about 1 nm. Damage control in the main pole fabrication would be one of the important issues for the write heads.

KW - Ion beam applications

KW - Iron alloys

KW - Magnetic heads

KW - Magnetic materials

KW - Magnetic recording

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JO - IEEE Transactions on Magnetics

JF - IEEE Transactions on Magnetics

IS - 6

M1 - 5467395

ER -

Irradiation damage in Fe-Co thin films with low-energy ion beam

Abstract

Keywords

ASJC Scopus subject areas

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