Ion-sputtering atomic beam source for high-resolution laser spectroscopy of refractory elements

M. Wakasugi, W. G. Jin, T. T. Inamura, T. Murayama, T. Wakui, T. Kashiwabara, H. Katsuragawa, T. Ariga, T. Ishizuka, M. Koizumi, I. Sugai

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9 Citations (Scopus)


A high-resolution laser spectroscopy system for refractory elements with an argon-ion- sputtering atomic beam source was constructed, and it has been demonstrated that the sputtering method is extremely useful as an atomic beam source for high-resolution laser spectroscopy to measure hyperfine structures and isotope shifts for refractory elements, such as Hf, Ta, and W. This source produced intense neutral atomic beams of more than 1010 atoms/s for these elements, and the yield was easily controlled by adjusting the argon-ion current and the acceleration voltage. Resonance linewidths were 32, 66, and 48 MHz for Hf, Ta, and W, respectively, which are sufficient to measure the hyperfine structures and the isotope shifts in optical transitions. With this system, the signal-to-noise ratio reached more than 106. In addition, the temperature of the sputtered atoms found was rather low compared to the kinetic energy given to the atoms.

Original languageEnglish
Pages (from-to)3487-3491
Number of pages5
JournalReview of Scientific Instruments
Issue number12
Publication statusPublished - 1993
Externally publishedYes

ASJC Scopus subject areas

  • Instrumentation


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