Ion irradiation effects on the optical properties of tungsten oxide films

S. Nagata; H. Fujita; A. Inouye; S. Yamamoto; B. Tsuchiya; T. Shikama

doi:10.1016/j.nimb.2010.05.076

Ion irradiation effects on the optical properties of tungsten oxide films

S. Nagata, H. Fujita, A. Inouye, S. Yamamoto, B. Tsuchiya, T. Shikama

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

The optical changes in amorphous WO₃ film prepared by reactive RF sputtering and irradiated by 200-800 keV oxygen ions were measured to study the relationship between coloration and energy deposition. The color centers were effectively created by ion irradiation with contributions from nuclear collisions and electronic energy loss. The increase in the absorption coefficient was reasonably explained by a first order reaction, whose production rate depended roughly on the total deposited energy. During heat treatment in air atmosphere, transmittance recovery started at 400 K and completed at 550 K. No significant difference was found among films irradiated by different incident energies; therefore indicating that the ion-induced damage structure is not strongly influenced by the type of energy loss.

Original language	English
Pages (from-to)	3151-3154
Number of pages	4
Journal	Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume	268
Issue number	19
DOIs	https://doi.org/10.1016/j.nimb.2010.05.076
Publication status	Published - 2010 Oct 1
Externally published	Yes

Keywords

Ion irradiation
Optical absorption
Oxygen
Tungsten oxide

ASJC Scopus subject areas

Nuclear and High Energy Physics
Instrumentation

Access to Document

10.1016/j.nimb.2010.05.076

Cite this

@article{0dad6f646e454ad99a3c90a6f45c5c6e,

title = "Ion irradiation effects on the optical properties of tungsten oxide films",

abstract = "The optical changes in amorphous WO3 film prepared by reactive RF sputtering and irradiated by 200-800 keV oxygen ions were measured to study the relationship between coloration and energy deposition. The color centers were effectively created by ion irradiation with contributions from nuclear collisions and electronic energy loss. The increase in the absorption coefficient was reasonably explained by a first order reaction, whose production rate depended roughly on the total deposited energy. During heat treatment in air atmosphere, transmittance recovery started at 400 K and completed at 550 K. No significant difference was found among films irradiated by different incident energies; therefore indicating that the ion-induced damage structure is not strongly influenced by the type of energy loss.",

keywords = "Ion irradiation, Optical absorption, Oxygen, Tungsten oxide",

author = "S. Nagata and H. Fujita and A. Inouye and S. Yamamoto and B. Tsuchiya and T. Shikama",

note = "Funding Information: This work is partly supported by a Grant-in-Aid for Scientific Research from the Japan Society for the Promotion of Science (Nos. 20360412 and 21656236 ).",

year = "2010",

month = oct,

day = "1",

doi = "10.1016/j.nimb.2010.05.076",

language = "English",

volume = "268",

pages = "3151--3154",

journal = "Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms",

issn = "0168-583X",

publisher = "Elsevier",

number = "19",

}

TY - JOUR

T1 - Ion irradiation effects on the optical properties of tungsten oxide films

AU - Nagata, S.

AU - Fujita, H.

AU - Inouye, A.

AU - Yamamoto, S.

AU - Tsuchiya, B.

AU - Shikama, T.

N1 - Funding Information: This work is partly supported by a Grant-in-Aid for Scientific Research from the Japan Society for the Promotion of Science (Nos. 20360412 and 21656236 ).

PY - 2010/10/1

Y1 - 2010/10/1

N2 - The optical changes in amorphous WO3 film prepared by reactive RF sputtering and irradiated by 200-800 keV oxygen ions were measured to study the relationship between coloration and energy deposition. The color centers were effectively created by ion irradiation with contributions from nuclear collisions and electronic energy loss. The increase in the absorption coefficient was reasonably explained by a first order reaction, whose production rate depended roughly on the total deposited energy. During heat treatment in air atmosphere, transmittance recovery started at 400 K and completed at 550 K. No significant difference was found among films irradiated by different incident energies; therefore indicating that the ion-induced damage structure is not strongly influenced by the type of energy loss.

AB - The optical changes in amorphous WO3 film prepared by reactive RF sputtering and irradiated by 200-800 keV oxygen ions were measured to study the relationship between coloration and energy deposition. The color centers were effectively created by ion irradiation with contributions from nuclear collisions and electronic energy loss. The increase in the absorption coefficient was reasonably explained by a first order reaction, whose production rate depended roughly on the total deposited energy. During heat treatment in air atmosphere, transmittance recovery started at 400 K and completed at 550 K. No significant difference was found among films irradiated by different incident energies; therefore indicating that the ion-induced damage structure is not strongly influenced by the type of energy loss.

KW - Ion irradiation

KW - Optical absorption

KW - Oxygen

KW - Tungsten oxide

UR - http://www.scopus.com/inward/record.url?scp=77956177577&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77956177577&partnerID=8YFLogxK

U2 - 10.1016/j.nimb.2010.05.076

DO - 10.1016/j.nimb.2010.05.076

M3 - Article

AN - SCOPUS:77956177577

SN - 0168-583X

VL - 268

SP - 3151

EP - 3154

JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

IS - 19

ER -

Ion irradiation effects on the optical properties of tungsten oxide films

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this