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Investigation of the TiN gate electrode with tunable work function and its application for FinFET fabrication
Yongxun Liu, Shinya Kijima, Etsuro Sugimata, Meishoku Masahara, Kazuhiko Endo, Takashi Matsukawa, Kenichi Ishii, Kunihiro Sakamoto, Toshihiro Sekigawa, Hiromi Yamauchi, Yoshifumi Takanashi, Eiichi Suzuki
Research output: Contribution to journal › Article › peer-review
103
Citations
(Scopus)