Investigation of the TiN gate electrode with tunable work function and its application for FinFET fabrication

Yongxun Liu, Shinya Kijima, Etsuro Sugimata, Meishoku Masahara, Kazuhiko Endo, Takashi Matsukawa, Kenichi Ishii, Kunihiro Sakamoto, Toshihiro Sekigawa, Hiromi Yamauchi, Yoshifumi Takanashi, Eiichi Suzuki

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103 Citations (Scopus)

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