Investigation of the crystallinity of N and Te codoped Zn-polar ZnO films grown by plasma-assisted molecular-beam epitaxy

S. H. Park, T. Minegishi, H. J. Lee, J. S. Park, I. H. Im, T. Yao, D. C. Oh, T. Taishi, I. Yonenaga, J. H. Chang

Research output: Contribution to journalArticlepeer-review

22 Citations (Scopus)

Abstract

We report on the crystallinity, N incorporation efficiency, optical properties, and electrical properties of N and Te codoped ZnO films grown by plasma-assisted molecular-beam epitaxy. Te improves the surface morphology and roughness of ZnO films in terms of both streak reflection high energy electron diffraction pattern and atomic force microscopy observations. Also, N and Te codoping is helpful to improve the crystallinity and N incorporation efficiency simultaneously. We found that; (a) narrower x-ray linewidth and higher N concentration were obtained by codoping. (b) Nitrogen related emission lines including donor-acceptor pair and acceptor-bound exciton dominantly emerged in photoluminescence spectra. (c) Codoping enhanced the carrier compensation of native donors in ZnO films and suppressed the dislocation scattering. As a consequence, we concluded that N and Te codoping is very effective for the growth of reliable p-type ZnO films which fulfill the controversial requirements; high N concentration and high crystallinity, simultaneously.

Original languageEnglish
Article number093518
JournalJournal of Applied Physics
Volume108
Issue number9
DOIs
Publication statusPublished - 2010 Nov 1

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'Investigation of the crystallinity of N and Te codoped Zn-polar ZnO films grown by plasma-assisted molecular-beam epitaxy'. Together they form a unique fingerprint.

Cite this