Abstract
The authors investigated the types of additive nonreactive fluorinated surfactants that effectively decrease the release energy of a certain ultraviolet-cured base resin for radical photopolymerization. The release energies of resins containing various surfactants were compared in two atmospheres, namely air and 1,1,1,3,3-pentafluoropropane (PFP, HFC-245fa). Tridecafluoro-1,1,2,2-tetrahydrooctan-1-ol functioned as the most effective surfactant under an air atmosphere, for detachment of a silica surface modified with tridecafluoro-1,1,2,2-tetrahydrotrimethoxysilane from the cured resins. Under a PFP atmosphere, heptadecafluoro-1,1,2,2-tetrahydrodecan-1-ol with a longer fluoroalkyl chain was necessary to effectively decrease the release energy. It was indicated that the segregation of liquid fluoroalkyl alcohols between the cured resin and modified mold was effective in decreasing the release energy of cured resins.
Original language | English |
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Article number | 06FB10 |
Journal | Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics |
Volume | 30 |
Issue number | 6 |
DOIs | |
Publication status | Published - 2012 Nov |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Instrumentation
- Process Chemistry and Technology
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering
- Materials Chemistry