Investigation of mask deformation by oxygen-radical irradiation during resist trimming

Naoyuki Kofuji, Hideo Miura

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)


The mechanism of resist-mask distortion during a resist trimming process was investigated experimentally. It was found that oxygen-radical irradiation creates a degraded layer on the resist surface and causes compressive stress. Non-uniform spatial distribution of oxygen radicals, therefore, causes asymmetrical irradiation of the radicals and makes an unbalanced or asymmetrical stress field on the resistmask surface. Such an asymmetrical stress field results in the distortion of a resist mask.

Original languageEnglish
Article number106501
JournalApplied Physics Express
Issue number10
Publication statusPublished - 2009 Oct 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)


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