Investigation of low-energy tilted ion implantation for fin-type double-gate metal-oxide-semiconductor field-effect transistor extension doping

Yongxun Liu, Takashi Matsukawa, Kazuhiko Endo, Shinich O'uchi, Kunihiro Sakamoto, Junichi Tsukada, Yuki Ishikawa, Hiromi Yamauchi, Meishoku Masahara

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20 Citations (Scopus)

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