Investigation for (100)-/(001)-oriented pb(zr,ti)o₃ films using platinum nanofacets and pbtio₃ seeding layer

The (100)-/(001)-oriented Pb(Zr,Ti)O3 films using Pt nanofacets and PbTiO3 seeding layer were invesigated. The Ti/Pt electrodes were deposited using a sputtering system. Pb(Zr,Ti)O3 and PbTiO3 seeding layer were deposited using a semi-homemade metal organic chemical vapor deposition (MOCVD) apparatus. The Pt nanofacets on hillocks caused by Ti diffusion and compressive stress can be prepared by preannealing of the electrode on the substrate. The most highly (100)-/(001)-oriented Pb(Zr,Ti)O3 films were obtained with the same thickness deposition of the PbTiO3 seeding layer as the half value of maximum roughness (Rz) of the Pt surface, which is approximately 3.5-4.0 nm. A simple (100)/(001) orientation method was developed without any special oxide metal electrodes or single-crystal substrates for orientation using commonly unpreferable hillocks, which cause the problems. This simple method is suitable for commercial applications in the future.