TY - JOUR
T1 - Inverted mesa-type quartz crystal resonators fabricated by deep-reactive ion etching
AU - Abe, Takashi
AU - Hung, Vu Ngoc
AU - Esashi, Masayoshi
N1 - Funding Information:
This work was supported by PRESTO of Japan Science and Technology Corporation (JST). A part of this work was done in Venture Business Laboratory, Tohoku University.
PY - 2006/7
Y1 - 2006/7
N2 - In this letter, we present experimental data showing Q change versus thickness for a quartz-crystal resonator fabricated with deep-reactive ion etching. Measurements show that Q increases as etch depth increases, and further that Q can be optimized as a function of etch depth and diameter of the resonator.
AB - In this letter, we present experimental data showing Q change versus thickness for a quartz-crystal resonator fabricated with deep-reactive ion etching. Measurements show that Q increases as etch depth increases, and further that Q can be optimized as a function of etch depth and diameter of the resonator.
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U2 - 10.1109/TUFFC.2006.1665070
DO - 10.1109/TUFFC.2006.1665070
M3 - Article
C2 - 16889329
AN - SCOPUS:33747274942
VL - 53
SP - 1234
EP - 1236
JO - Transactions of the IRE Professional Group on Ultrasonic Engineering
JF - Transactions of the IRE Professional Group on Ultrasonic Engineering
SN - 0885-3010
IS - 7
M1 - 1665070
ER -