Inverted mesa-type quartz crystal resonators fabricated by deep-reactive ion etching

Takashi Abe, Vu Ngoc Hung, Masayoshi Esashi

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)

Abstract

In this letter, we present experimental data showing Q change versus thickness for a quartz-crystal resonator fabricated with deep-reactive ion etching. Measurements show that Q increases as etch depth increases, and further that Q can be optimized as a function of etch depth and diameter of the resonator.

Original languageEnglish
Article number1665070
Pages (from-to)1234-1236
Number of pages3
JournalIEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control
Volume53
Issue number7
DOIs
Publication statusPublished - 2006 Jul 1

ASJC Scopus subject areas

  • Instrumentation
  • Acoustics and Ultrasonics
  • Electrical and Electronic Engineering

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