Inverted mesa-type quartz crystal resonators fabricated by deep-reactive ion etching

Takashi Abe; Vu Ngoc Hung; Masayoshi Esashi

doi:10.1109/TUFFC.2006.1665070

Inverted mesa-type quartz crystal resonators fabricated by deep-reactive ion etching

Takashi Abe, Vu Ngoc Hung, Masayoshi Esashi

Micro System Integration Center (μSIC)

Research output: Contribution to journal › Article › peer-review

9 Citations (Scopus)

Abstract

In this letter, we present experimental data showing Q change versus thickness for a quartz-crystal resonator fabricated with deep-reactive ion etching. Measurements show that Q increases as etch depth increases, and further that Q can be optimized as a function of etch depth and diameter of the resonator.

Original language	English
Article number	1665070
Pages (from-to)	1234-1236
Number of pages	3
Journal	IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control
Volume	53
Issue number	7
DOIs	https://doi.org/10.1109/TUFFC.2006.1665070
Publication status	Published - 2006 Jul 1

ASJC Scopus subject areas

Instrumentation
Acoustics and Ultrasonics
Electrical and Electronic Engineering

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@article{1c4e46ee4c52403eb693d2d43828fa34,

title = "Inverted mesa-type quartz crystal resonators fabricated by deep-reactive ion etching",

abstract = "In this letter, we present experimental data showing Q change versus thickness for a quartz-crystal resonator fabricated with deep-reactive ion etching. Measurements show that Q increases as etch depth increases, and further that Q can be optimized as a function of etch depth and diameter of the resonator.",

author = "Takashi Abe and Hung, {Vu Ngoc} and Masayoshi Esashi",

year = "2006",

month = jul,

day = "1",

doi = "10.1109/TUFFC.2006.1665070",

language = "English",

volume = "53",

pages = "1234--1236",

journal = "Transactions of the IRE Professional Group on Ultrasonic Engineering",

issn = "0885-3010",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

number = "7",

}

TY - JOUR

T1 - Inverted mesa-type quartz crystal resonators fabricated by deep-reactive ion etching

AU - Abe, Takashi

AU - Hung, Vu Ngoc

AU - Esashi, Masayoshi

PY - 2006/7/1

Y1 - 2006/7/1

N2 - In this letter, we present experimental data showing Q change versus thickness for a quartz-crystal resonator fabricated with deep-reactive ion etching. Measurements show that Q increases as etch depth increases, and further that Q can be optimized as a function of etch depth and diameter of the resonator.

AB - In this letter, we present experimental data showing Q change versus thickness for a quartz-crystal resonator fabricated with deep-reactive ion etching. Measurements show that Q increases as etch depth increases, and further that Q can be optimized as a function of etch depth and diameter of the resonator.

UR - http://www.scopus.com/inward/record.url?scp=33747274942&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33747274942&partnerID=8YFLogxK

U2 - 10.1109/TUFFC.2006.1665070

DO - 10.1109/TUFFC.2006.1665070

M3 - Article

C2 - 16889329

AN - SCOPUS:33747274942

VL - 53

SP - 1234

EP - 1236

JO - Transactions of the IRE Professional Group on Ultrasonic Engineering

JF - Transactions of the IRE Professional Group on Ultrasonic Engineering

SN - 0885-3010

IS - 7

M1 - 1665070

ER -