Interlayer exchange coupling in full heusler Co2FeSi/Cr/Co 2FeSi epitaxial trilayer structures

Subrojati Bosu, Yuya Sakuraba, Kesami Saito, Hai Wang, Koki Takanashi

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

Interlayer exchange coupling was investigated in Co2FeSi(20nm)/ Cr(tCr=0.6 to 3 nm)/Co2FeSi(7 nm) epitaxial trilayer structures by M-H loop measurement and using a numerical simulation method. The epitaxial growth and the presence of partial B2 ordering in Co2FeSi films were confirmed from the XRD patterns. The bilinear coupling parameter J1 and 90° coupling parameter J2 were determined from the numerical simulation of M-H loops for trilayers. The absence of 180° coupling and the presence of dominating 90° coupling were observed from the comparison between the numerical simulations and measured M-H loops within a wide range of spacer thickness. The strength of the 90° coupling was found to vary with the spacer thickness and only a peak of J2 was observed at tCr=1.2 nm.

Original languageEnglish
Article number5467678
Pages (from-to)2052-2055
Number of pages4
JournalIEEE Transactions on Magnetics
Volume46
Issue number6
DOIs
Publication statusPublished - 2010 Jun 1

Keywords

  • 90° coupling
  • B2 ordering
  • CoFeSi
  • Full-Heusler alloy
  • Interlayer exchange coupling

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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