Interlayer coupling of Fe/Si/Fe trilayers with very thin boundary layers

Y. Endo, O. Kitakami, Y. Shimada

Research output: Contribution to journalConference articlepeer-review

12 Citations (Scopus)

Abstract

The interlayer magnetic coupling of a Fe/Si/Fe trilayer shows an analogous feature to that of Fe/Si superlattices. With an increase in Si layer thickness, it oscillates as ferromagnetic (first F), antiferromagnetic (AF), ferromagnetic (second F), and finally reaches a noncoupling (N) state. We have investigated interlayer coupling of Fe/Si/Fe trilayers inserting very thin (1 or 2 ML thick) boundary layers X (X=Ag, Ge, Fe-Si, Ta, etc.). They are expected to suppress interatomic diffusion between Fe and Si layers. Interlayer coupling of Fe/X/Si/X/Fe with negligible interdiffusion is simply F and changes to N as the Si layer thickness increases. Furthermore, Fe/Fe-Si/Fe trilayers which show coupling of first F, AF but not second F, reproduce second F when a Si layer is inserted in the Fe-Si spacer. These results imply that an amorphous Si spacer mediates ferromagnetic coupling between neighboring Fe layers while the first F and the strong AF coupling usually observed in Fe/Si superlattices are caused by diffused crystalline Fe-Si.

Original languageEnglish
Pages (from-to)5741-5743
Number of pages3
JournalJournal of Applied Physics
Volume85
Issue number8 II B
DOIs
Publication statusPublished - 1999 Apr 15
EventProceedings of the 43rd Annual Conference on Magnetism and Magnetic Materials - Miami, FL, United States
Duration: 1998 Nov 91998 Nov 12

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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