Interface nanostructure of brazed silicon nitride

Chihiro Iwamoto, Shun Ichiro Tanaka

Research output: Contribution to journalArticlepeer-review

28 Citations (Scopus)


Nanomorphologies and cristallographic orientations of the brazed interface of silicon nitride (Si 3N 4) were analyzed via high-resolution transmission electron microscopy. When Si 3N 4 was brazed using an Ag-Cu-Ti alloy, titanium nitride (TiN) nanoparticles were formed adjacent to the ceramic as reaction products, and these nanoparticles were commonly accompanied by C-phase material. The structure of Si 3N 4/TiN interface was wavy on an atomic scale, which was considered to provide anchoring points that offered high mechanical strength. The TiN nanoparticles extended along the [0001] axis of Si 3N 4. The orientation relationship between TiN and β-Si 3N 4 was, as determined from the observed lattice images, that the [110] direction of TiN was parallel to the [0001] direction of Si 3N 4. The nature of the crystallographic relationships and interface nanomorphologies were also discussed.

Original languageEnglish
Pages (from-to)363-368
Number of pages6
JournalJournal of the American Ceramic Society
Issue number2
Publication statusPublished - 1998 Feb 1
Externally publishedYes

ASJC Scopus subject areas

  • Ceramics and Composites
  • Materials Chemistry


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