Interface engineering for the passivation of c-Si with O 3-based atomic layer deposited AlO x for solar cell application

Hyunju Lee, Tomihisa Tachibana, Norihiro Ikeno, Hiroki Hashiguchi, Koji Arafune, Haruhiko Yoshida, Shin Ichi Satoh, Toyohiro Chikyow, Atsushi Ogura

Research output: Contribution to journal › Article › peer-review

28 Citations (Scopus)

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Physics & Astronomy