Interdiffused layers in antiferromagnetically coupled Fe/Si multilayers studied by soft-X-ray fluorescence spectroscopy

Takashi Imazono, Yushi Hirayama, Shigeru Ichikura, Osamu Kitakami, Mihiro Yanagihara, Makoto Watanabe

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

We measured the Si L2,3 fluorescence spectrum of an antiferromagnetically coupled Fe (3.0 nm)/Si (1.3 nm) multilayer using undulator synchrotron radiation. We estimated the chemical composition and thickness of Fe suicide layers formed by interdiffusion by curve fitting analysis using the fluorescence spectra of amorphous Fe suicides. We clarified that the amorphous Si layer of 1.3 nm thickness changed in its middle region into amorphous FeSi2 of 0.7 nm thickness, which plays an important role in the strong antiferromagnetic exchange coupling in the Fe/Si multilayer. It was also confirmed that soft-X-ray fluorescence spectroscopy has a high potential for analyzing buried interfaces nondestructively.

Original languageEnglish
Pages (from-to)4327-4333
Number of pages7
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume43
Issue number7 A
DOIs
Publication statusPublished - 2004 Jul 1

Keywords

  • Fe/Si multilayer
  • Interdiffusion
  • Interface
  • Magnetic exchange coupling
  • Soft X-ray fluorescence

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'Interdiffused layers in antiferromagnetically coupled Fe/Si multilayers studied by soft-X-ray fluorescence spectroscopy'. Together they form a unique fingerprint.

  • Cite this