Interdiffused layers in antiferromagnetically coupled Fe/Si multilayers studied by soft-X-ray fluorescence spectroscopy

Takashi Imazono; Yushi Hirayama; Shigeru Ichikura; Osamu Kitakami; Mihiro Yanagihara; Makoto Watanabe

doi:10.1143/JJAP.43.4327

Interdiffused layers in antiferromagnetically coupled Fe/Si multilayers studied by soft-X-ray fluorescence spectroscopy

Takashi Imazono, Yushi Hirayama, Shigeru Ichikura, Osamu Kitakami, Mihiro Yanagihara, Makoto Watanabe

Division of Inorganic Material Research

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

Abstract

We measured the Si L_2,3 fluorescence spectrum of an antiferromagnetically coupled Fe (3.0 nm)/Si (1.3 nm) multilayer using undulator synchrotron radiation. We estimated the chemical composition and thickness of Fe suicide layers formed by interdiffusion by curve fitting analysis using the fluorescence spectra of amorphous Fe suicides. We clarified that the amorphous Si layer of 1.3 nm thickness changed in its middle region into amorphous FeSi₂ of 0.7 nm thickness, which plays an important role in the strong antiferromagnetic exchange coupling in the Fe/Si multilayer. It was also confirmed that soft-X-ray fluorescence spectroscopy has a high potential for analyzing buried interfaces nondestructively.

Original language	English
Pages (from-to)	4327-4333
Number of pages	7
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	43
Issue number	7 A
DOIs	https://doi.org/10.1143/JJAP.43.4327
Publication status	Published - 2004 Jul

Keywords

Fe/Si multilayer
Interdiffusion
Interface
Magnetic exchange coupling
Soft X-ray fluorescence

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

UN SDGs

This output contributes to the following Sustainable Development Goal(s)

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Interdiffused layers in antiferromagnetically coupled Fe/Si multilayers studied by soft-X-ray fluorescence spectroscopy. / Imazono, Takashi; Hirayama, Yushi; Ichikura, Shigeru; Kitakami, Osamu; Yanagihara, Mihiro; Watanabe, Makoto.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 43, No. 7 A, 07.2004, p. 4327-4333.

Research output: Contribution to journal › Article › peer-review

Imazono, T, Hirayama, Y, Ichikura, S, Kitakami, O, Yanagihara, M & Watanabe, M 2004, 'Interdiffused layers in antiferromagnetically coupled Fe/Si multilayers studied by soft-X-ray fluorescence spectroscopy', Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, vol. 43, no. 7 A, pp. 4327-4333. https://doi.org/10.1143/JJAP.43.4327

Imazono, Takashi ; Hirayama, Yushi ; Ichikura, Shigeru ; Kitakami, Osamu ; Yanagihara, Mihiro ; Watanabe, Makoto. / Interdiffused layers in antiferromagnetically coupled Fe/Si multilayers studied by soft-X-ray fluorescence spectroscopy. In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 2004 ; Vol. 43, No. 7 A. pp. 4327-4333.

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abstract = "We measured the Si L2,3 fluorescence spectrum of an antiferromagnetically coupled Fe (3.0 nm)/Si (1.3 nm) multilayer using undulator synchrotron radiation. We estimated the chemical composition and thickness of Fe suicide layers formed by interdiffusion by curve fitting analysis using the fluorescence spectra of amorphous Fe suicides. We clarified that the amorphous Si layer of 1.3 nm thickness changed in its middle region into amorphous FeSi2 of 0.7 nm thickness, which plays an important role in the strong antiferromagnetic exchange coupling in the Fe/Si multilayer. It was also confirmed that soft-X-ray fluorescence spectroscopy has a high potential for analyzing buried interfaces nondestructively.",

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AU - Imazono, Takashi

AU - Hirayama, Yushi

AU - Ichikura, Shigeru

AU - Kitakami, Osamu

AU - Yanagihara, Mihiro

AU - Watanabe, Makoto

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N2 - We measured the Si L2,3 fluorescence spectrum of an antiferromagnetically coupled Fe (3.0 nm)/Si (1.3 nm) multilayer using undulator synchrotron radiation. We estimated the chemical composition and thickness of Fe suicide layers formed by interdiffusion by curve fitting analysis using the fluorescence spectra of amorphous Fe suicides. We clarified that the amorphous Si layer of 1.3 nm thickness changed in its middle region into amorphous FeSi2 of 0.7 nm thickness, which plays an important role in the strong antiferromagnetic exchange coupling in the Fe/Si multilayer. It was also confirmed that soft-X-ray fluorescence spectroscopy has a high potential for analyzing buried interfaces nondestructively.

AB - We measured the Si L2,3 fluorescence spectrum of an antiferromagnetically coupled Fe (3.0 nm)/Si (1.3 nm) multilayer using undulator synchrotron radiation. We estimated the chemical composition and thickness of Fe suicide layers formed by interdiffusion by curve fitting analysis using the fluorescence spectra of amorphous Fe suicides. We clarified that the amorphous Si layer of 1.3 nm thickness changed in its middle region into amorphous FeSi2 of 0.7 nm thickness, which plays an important role in the strong antiferromagnetic exchange coupling in the Fe/Si multilayer. It was also confirmed that soft-X-ray fluorescence spectroscopy has a high potential for analyzing buried interfaces nondestructively.

KW - Fe/Si multilayer

KW - Interdiffusion

KW - Interface

KW - Magnetic exchange coupling

KW - Soft X-ray fluorescence

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Interdiffused layers in antiferromagnetically coupled Fe/Si multilayers studied by soft-X-ray fluorescence spectroscopy

Abstract

Keywords

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UN SDGs

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