Interaction of Ga adsorbates with dangling bonds on the hydrogen terminated Si(100) surface

Tomihiro Hashizume, Seiji Heike, Mark I. Lutwyche, Satoshi Watanabe, Ken Nakajima, Toshio Nishi, Yasuo Wada

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    131 Citations (Scopus)

    Abstract

    Adsorption of Ga on the hydrogen terminated Si(100)-2 x 1-H surface has been investigated by scanning tunneling microscopy (STM). We have found that the thermally deposited Ga atoms preferentially adsorb on the hydrogen-missing dangling bonds and on the surface impurities. We desorb hydrogen atoms by the STM current and fabricate atomic-scale dangling-bond wires, in the similar way as was reported by Lyding et al. [Appl. Phys. Lett. 64 (1994) 2010]. In order to fabricate more detailed dangling bond structures, several methods of manipulating (detaching, attaching and moving) the individual hydrogen atoms are tested. We are able to thermally deposit Ga atoms on a dangling-bond wire and fabricate an atomic-scale Ga wire on the Si surface.

    Original languageEnglish
    Pages (from-to)L1085-L1088
    JournalJapanese Journal of Applied Physics, Part 2: Letters
    Volume35
    Issue number8 SUPPL. B
    DOIs
    Publication statusPublished - 1996 Aug 15

    Keywords

    • Adsorption
    • Atomic wire
    • Dangling bond
    • Ga
    • Hydrogen terminated
    • Si(100)

    ASJC Scopus subject areas

    • Engineering(all)
    • Physics and Astronomy (miscellaneous)
    • Physics and Astronomy(all)

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