Interaction between hydrogen plasma and hydrogenated amorphous carbon film, investigated by infrared spectroscopy

Masanori Shinohara, Ken Cho, Hiromichi Shibata, Keishi Okamoto, Tatsuyuki Nakatani, Yoshinobu Matsuda, Hiroshi Fujiyama

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

Interaction between hydrogen plasma and hydrogenated amorphous carbon films was investigated. The changes in the bonding configuration of the hydrocarbon species due to the hydrogen plasma treatments were investigated by using infrared spectroscopy in multiple internal reflection geometry (MIR-IRAS). Further, to reinforce the results, etching rates were also investigated. These results suggested that the hydrogen ions generated in the plasma physically etched the amorphous carbon film at the high rate; on the other hand, the hydrogen radicals also etched the hydrogenated film at the low rate through hydrogenation of the film.

Original languageEnglish
Pages (from-to)4379-4383
Number of pages5
JournalThin Solid Films
Volume516
Issue number13
DOIs
Publication statusPublished - 2008 May 1

Keywords

  • Hydrocarbon
  • Hydrogen
  • Infrared spectroscopy
  • Plasma etching

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Fingerprint Dive into the research topics of 'Interaction between hydrogen plasma and hydrogenated amorphous carbon film, investigated by infrared spectroscopy'. Together they form a unique fingerprint.

  • Cite this

    Shinohara, M., Cho, K., Shibata, H., Okamoto, K., Nakatani, T., Matsuda, Y., & Fujiyama, H. (2008). Interaction between hydrogen plasma and hydrogenated amorphous carbon film, investigated by infrared spectroscopy. Thin Solid Films, 516(13), 4379-4383. https://doi.org/10.1016/j.tsf.2007.10.014