Integration of grating-image-type encoder using Si micromachining

K. Hane, T. Endo, M. Ishimori, Y. Ito, M. Sasaki

Research output: Contribution to journalConference articlepeer-review

30 Citations (Scopus)


Integration of a grating-image-type encoder is proposed and the sensor for the encoder has been fabricated using Si micromachining technology. The sensor consists of the Si grids with line photodiodes, light emitting diode (LED) and signal amplifier. The Si grids works as the photodetectors as well as the object and index gratings. The incoherent light emission through the Si grids and the light detection with the grids make the optical system compact. Phase change of the signal is caused by the translation of the grating image on the Si grids. Two phase-shifted signals are generated by installing two sets of photodiodes on the Si substrate with a corresponding spatial displacement. Two types of grating structures are fabricated for the practical sensors. The signal contrast is high enough for the displacement measurements at a large air gap.

Original languageEnglish
Pages (from-to)139-146
Number of pages8
JournalSensors and Actuators, A: Physical
Publication statusPublished - 2002 Apr 1
EventTransducers'01 Eurosensors XV - Munich, Germany
Duration: 2001 Jun 102001 Jun 14


  • Displacement sensing
  • Encoder
  • Grating
  • Optical sensor
  • Si micromachining

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Electrical and Electronic Engineering


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