Innovative nanoimprint lithography using PFP condensable gas

Hiroshi Hiroshima, Masaru Nakagawa, Yoshihiko Hirai, Shinji Matsui

    Research output: Contribution to journalArticlepeer-review

    4 Citations (Scopus)

    Abstract

    The effectiveness of condensable gas, used as ambience, in UV nanoimprint lithography has been demonstrated. Bubble defect problem, which is inherent in UV nanoimprint under non vacuum ambience, can be solved by PFP condensable gas. UV nanoimprint lithography using PFP was validated for 45 nm pattern fabrication under thin residual layer conditions, which are required for UV nanoimprint used as UV nanoimprint lithography. PFP reduces the viscosity and demolding force of UV curable resins. These properties are helpful in increasing the throughput and reliability of UV nanoimprint. PFP occasionally produces large shrinkages, and degrades pattern quality depending on UV curable resin. These drawbacks can be mitigated by selecting UV curable monomers with a low PFP absorption with a solubility parameter away from 20(J/cm3)1/2. UV nanoimprint using PFP is so striking that we now think use of PFP be an integral part of UV nanoimprint.

    Original languageEnglish
    Pages (from-to)87-96
    Number of pages10
    JournalJournal of Photopolymer Science and Technology
    Volume26
    Issue number1
    DOIs
    Publication statusPublished - 2013 Aug 2

    Keywords

    • Condensable gas
    • Demolding force
    • Lithography
    • Pentafluoropropane
    • Solubility parameter
    • Throughput
    • UV nanoimprint

    ASJC Scopus subject areas

    • Polymers and Plastics
    • Organic Chemistry
    • Materials Chemistry

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