INITIAL STAGE OF SPUTTERING AT SILICON OXIDE SURFACE.

Takeo Hattori, Yukimoto Hisajima, Hiroyuki Saito, Toshihisa Suzuki, Hiroshi Daimon, Yoshitada Murata

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Original languageEnglish
    Title of host publicationUnknown Host Publication Title
    PublisherBerliner Elekronenspeicherring-Gesellschaft fuer Synchrotronstrahlung
    Publication statusPublished - 1982

    ASJC Scopus subject areas

    • Engineering(all)

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