Initial oxidation of MBE-grown Si( 100) surfaces

Yaguchi Hiroyuki, Fujita Ken, Fukatsu Susumu, Shiraki Yasuhiro, Ito Ryoichi, Igarashi Takayuki, Hattori Takeo

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    8 Citations (Scopus)

    Abstract

    We have investigated the initial oxidation of MBE-grown Si(100) surfaces with atomic flatness using X-ray photoemission spectroscopy (XPS) and reflection high energy electron diffraction (RHEED). It was found that the MBE-grown surfaces are inert and hardly oxidized even after exposure to molecular oxygen up to 1500 L at room temperature and that the oxygen coverage is saturated at 0.4 ML. At elevated temperatures, however, the surface oxidation was substantially promoted on the atomically flat surface. On the other hand, the oxidation was found to proceed on a deliberately corrugated Si surface prepared by a low temperature MBE growth, even at room temperature.

    Original languageEnglish
    Pages (from-to)395-400
    Number of pages6
    JournalSurface Science
    Volume275
    Issue number3
    DOIs
    Publication statusPublished - 1992 Sep 15

    ASJC Scopus subject areas

    • Condensed Matter Physics
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films
    • Materials Chemistry

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