Initial growth stage of nanoscaled TiN films: Formation of continuous amorphous layers and thickness-dependent crystal nucleation

T. Q. Li, S. Noda, H. Komiyama, T. Yamamoto, Y. Ikuhara

    Research output: Contribution to journalArticle

    34 Citations (Scopus)

    Abstract

    The initial growth stage of titanium nitride (TiN) deposited by reactive magnetron sputtering onto (111)-oriented Si substrates was discussed. It was found that the growth of the crystal grains depended on the N2 partial pressure. The analysis showed that for films formed at N2 partial pressure equal to 0.47 Pa, an amorphous interlayer 1.5-1.8 nm thick formed between the TiN layer and Si substrate.

    Original languageEnglish
    Pages (from-to)1717-1723
    Number of pages7
    JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
    Volume21
    Issue number5
    DOIs
    Publication statusPublished - 2003 Sep 1

    ASJC Scopus subject areas

    • Condensed Matter Physics
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films

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