Initial adsorption and C-incorporation of organosilanes at Si(0 0 1) investigated by temperature-programmed desorption

K. Senthil, M. Suemitsu

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Temperature-programmed desorption (TPD) has been used to study the initial adsorption and C-incorporation of organosilanes [monomethylsilane (MMS), dimethylsilane (DMS) and trimethylsilane (TMS)] at Si(0 0 1) surfaces. Hydrogen was the only desorbing species observed in the TPD spectra from organosilanes. Organosilane molecules adsorb dissociatively on the Si(0 0 1) surfaces at room temperature. TPD spectra from DMS- and TMS-adsorbed Si surfaces present carbon-related hydrogen (H 2 ) desorption peaks from the initial adsorption. The carbon-incorporation ratio was found to be larger in the order of TMS > DMS > MMS, with the sticking probability of molecules being almost identical for the three organosilane molecules.

Original languageEnglish
Pages (from-to)270-275
Number of pages6
JournalApplied Surface Science
Volume242
Issue number3-4
DOIs
Publication statusPublished - 2005 Apr 15

Keywords

  • Carbon incorporation
  • Organosilanes
  • Si(0 0 1) surface
  • Thermal desorption

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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