Initial adsorption and C-incorporation of organosilanes at Si(0 0 1) investigated by temperature-programmed desorption

K. Senthil; M. Suemitsu

doi:10.1016/j.apsusc.2004.08.020

Initial adsorption and C-incorporation of organosilanes at Si(0 0 1) investigated by temperature-programmed desorption

K. Senthil, M. Suemitsu

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

Temperature-programmed desorption (TPD) has been used to study the initial adsorption and C-incorporation of organosilanes [monomethylsilane (MMS), dimethylsilane (DMS) and trimethylsilane (TMS)] at Si(0 0 1) surfaces. Hydrogen was the only desorbing species observed in the TPD spectra from organosilanes. Organosilane molecules adsorb dissociatively on the Si(0 0 1) surfaces at room temperature. TPD spectra from DMS- and TMS-adsorbed Si surfaces present carbon-related hydrogen (H ₂ ) desorption peaks from the initial adsorption. The carbon-incorporation ratio was found to be larger in the order of TMS > DMS > MMS, with the sticking probability of molecules being almost identical for the three organosilane molecules.

Original language	English
Pages (from-to)	270-275
Number of pages	6
Journal	Applied Surface Science
Volume	242
Issue number	3-4
DOIs	https://doi.org/10.1016/j.apsusc.2004.08.020
Publication status	Published - 2005 Apr 15
Externally published	Yes

Keywords

Carbon incorporation
Organosilanes
Si(0 0 1) surface
Thermal desorption

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Physics and Astronomy(all)
Surfaces and Interfaces
Surfaces, Coatings and Films

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10.1016/j.apsusc.2004.08.020

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@article{24792b26a6b64ca882284ccb7c8710d4,

title = "Initial adsorption and C-incorporation of organosilanes at Si(0 0 1) investigated by temperature-programmed desorption",

abstract = " Temperature-programmed desorption (TPD) has been used to study the initial adsorption and C-incorporation of organosilanes [monomethylsilane (MMS), dimethylsilane (DMS) and trimethylsilane (TMS)] at Si(0 0 1) surfaces. Hydrogen was the only desorbing species observed in the TPD spectra from organosilanes. Organosilane molecules adsorb dissociatively on the Si(0 0 1) surfaces at room temperature. TPD spectra from DMS- and TMS-adsorbed Si surfaces present carbon-related hydrogen (H 2 ) desorption peaks from the initial adsorption. The carbon-incorporation ratio was found to be larger in the order of TMS > DMS > MMS, with the sticking probability of molecules being almost identical for the three organosilane molecules.",

keywords = "Carbon incorporation, Organosilanes, Si(0 0 1) surface, Thermal desorption",

author = "K. Senthil and M. Suemitsu",

note = "Funding Information: This work was supported in part by a Grant-in-Aid for Scientific Research from the Ministry of Education, Culture, Sports, Science and Technology, Japan.",

year = "2005",

month = apr,

day = "15",

doi = "10.1016/j.apsusc.2004.08.020",

language = "English",

volume = "242",

pages = "270--275",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier",

number = "3-4",

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TY - JOUR

T1 - Initial adsorption and C-incorporation of organosilanes at Si(0 0 1) investigated by temperature-programmed desorption

AU - Senthil, K.

AU - Suemitsu, M.

N1 - Funding Information: This work was supported in part by a Grant-in-Aid for Scientific Research from the Ministry of Education, Culture, Sports, Science and Technology, Japan.

PY - 2005/4/15

Y1 - 2005/4/15

N2 - Temperature-programmed desorption (TPD) has been used to study the initial adsorption and C-incorporation of organosilanes [monomethylsilane (MMS), dimethylsilane (DMS) and trimethylsilane (TMS)] at Si(0 0 1) surfaces. Hydrogen was the only desorbing species observed in the TPD spectra from organosilanes. Organosilane molecules adsorb dissociatively on the Si(0 0 1) surfaces at room temperature. TPD spectra from DMS- and TMS-adsorbed Si surfaces present carbon-related hydrogen (H 2 ) desorption peaks from the initial adsorption. The carbon-incorporation ratio was found to be larger in the order of TMS > DMS > MMS, with the sticking probability of molecules being almost identical for the three organosilane molecules.

AB - Temperature-programmed desorption (TPD) has been used to study the initial adsorption and C-incorporation of organosilanes [monomethylsilane (MMS), dimethylsilane (DMS) and trimethylsilane (TMS)] at Si(0 0 1) surfaces. Hydrogen was the only desorbing species observed in the TPD spectra from organosilanes. Organosilane molecules adsorb dissociatively on the Si(0 0 1) surfaces at room temperature. TPD spectra from DMS- and TMS-adsorbed Si surfaces present carbon-related hydrogen (H 2 ) desorption peaks from the initial adsorption. The carbon-incorporation ratio was found to be larger in the order of TMS > DMS > MMS, with the sticking probability of molecules being almost identical for the three organosilane molecules.

KW - Carbon incorporation

KW - Organosilanes

KW - Si(0 0 1) surface

KW - Thermal desorption

UR - http://www.scopus.com/inward/record.url?scp=13444304120&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=13444304120&partnerID=8YFLogxK

U2 - 10.1016/j.apsusc.2004.08.020

DO - 10.1016/j.apsusc.2004.08.020

M3 - Article

AN - SCOPUS:13444304120

SN - 0169-4332

VL - 242

SP - 270

EP - 275

JO - Applied Surface Science

JF - Applied Surface Science

IS - 3-4

ER -

Initial adsorption and C-incorporation of organosilanes at Si(0 0 1) investigated by temperature-programmed desorption

Abstract

Keywords

ASJC Scopus subject areas

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