Infrared study of adsorption and thermal decomposition of Si2H6 on Si(100)

Masanori Shinohara, Michio Niwano, Yoichiro Neo, Kuniyoshi Yokoo

Research output: Contribution to journalConference articlepeer-review

29 Citations (Scopus)


We have investigated the adsorption and thermal decomposition of disilane on Si(100) (2×1) using infrared absorption spectroscopy. We demonstrate that at room temperature, disilane dissociatively adsorbs onto the surface with the dimer bond unbroken, to produce mono-, di-, and tri-hydride species. At low coverages, the disilane molecule adsorbs on the surface without breaking the Si-Si bond of the molecule. Thermal annealing following room-temperature adsorption of disilane produces a hydrogen-terminated adatom dimer (HSi-SiH) and an isolated monohydride species. We suggest that these hydride species are generated through the rupture of the substrate dimer bonds. Hydrogen desorption from the isolated monohydride occurs at much lower temperature than that from the adatom dimer.

Original languageEnglish
Pages (from-to)16-20
Number of pages5
JournalThin Solid Films
Issue number1
Publication statusPublished - 2000 Jul 3
Externally publishedYes
EventThe International Joint Conference on Silicon Epitaxyand Heterostructures (IJC-SI) - Miyagi, Jpn
Duration: 1999 Sep 121999 Sep 17

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry


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