Infrared spectroscopy study of adsorption of silane on Si(0 0 1)

Masanori Shinohara, Yasuo Kimura, Mineo Saito, Michio Niwano

Research output: Contribution to journalArticle

38 Citations (Scopus)

Abstract

We used infrared absorption spectroscopy in the multiple internal reflection geometry to investigate the adsorption of SiH4 on the Si(0 0 1)(2 × 1) surface. Comparing infrared data with the density functional cluster calculation, we show that at low hydrogen coverage the silane molecule dissociatively adsorbs on Si(0 0 1)(2 × 1) to populate a dihydride (SiH2) at the bridge site between two adjacent dimers and monohydride species; monohydrides are formed by terminating the unsaturated dangling bonds of dimers by hydrogen atoms released from the silane molecule. We suggest that at high hydrogen coverage, silane adsorbs onto a single dimer to generate monohydride and sylil groups (-SiH3). We also demonstrate that the dihydride species that is initially generated by silane adsorption, decomposes to monohydride species even at room temperature.

Original languageEnglish
Pages (from-to)96-101
Number of pages6
JournalSurface Science
Volume502-503
DOIs
Publication statusPublished - 2002 Apr 10

Keywords

  • Infrared absorption spectroscopy
  • Semiconducting surfaces
  • Silane
  • Silicon
  • Surface chemical reaction

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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