Influences of annealing conditions on flatband voltage properties using continuously workfunction-tuned metal electrodes

K. Ohmori, P. Ahmet, K. Shiraishi, H. Watanabe, Y. Akasaka, K. Yamabe, M. Yoshitake, K. S. Chang, M. L. Green, K. Yamada, Toyohiro Chikyo

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publication1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006
Pages160-162
Number of pages3
DOIs
Publication statusPublished - 2006 Dec 1
Externally publishedYes
Event1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006 - Mishima, Shizuoka, Japan
Duration: 2006 Jan 302006 Feb 1

Publication series

Name2006 International Workshop on Nano CMOS - Proceedings, IWNC

Other

Other1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006
CountryJapan
CityMishima, Shizuoka
Period06/1/3006/2/1

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

Cite this

Ohmori, K., Ahmet, P., Shiraishi, K., Watanabe, H., Akasaka, Y., Yamabe, K., Yoshitake, M., Chang, K. S., Green, M. L., Yamada, K., & Chikyo, T. (2006). Influences of annealing conditions on flatband voltage properties using continuously workfunction-tuned metal electrodes. In 1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006 (pp. 160-162). [4570988] (2006 International Workshop on Nano CMOS - Proceedings, IWNC). https://doi.org/10.1109/IWNC.2006.4570988